10:45 AM - 11:00 AM [5a-A203-7] Investigation on slow traps of 4H-SiC MOS capacitors based on the analysis of hysteresis of C-V characteristics observed byEvaluation of SiO2/SiC interface deep states and near interface oxide traps by using photo illumination photo irradiation 〇Mizuki Nishida1, Hirohisa Hirai1, Koji Kita1 (1.The Univ. of Tokyo)