Wataru Nakano

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Speaker, Author, Co-Author

Thu. Sep 7, 2017 9:00 AM - 12:30 PM C21 (C21)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[7a-C21-1~13] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

11:30 AM - 11:45 AM

[7a-C21-10] High Speed Crystallization of Amorphous Silicon Films on Flexible Glass Substrate by Atmospheric Pressure Thermal-Plasma-Jet Irradiation Using Cylindrical Rotation Stage

〇Wataru Nakano¹, Hiroaki Hanafusa¹, Seiichiro Higashi¹ (1.Hiroshima Univ.)

Tue. Sep 5, 2017 9:00 AM - 12:00 PM A204 (204)

Oral presentation
| 16 Amorphous and Microcrystalline Materials
| 16.3 Bulk, thin-film and other silicon-based solar cells

[5a-A204-1~11] 16.3 Bulk, thin-film and other silicon-based solar cells

9:30 AM - 9:45 AM

[5a-A204-3] Nitrogen-boosted Atmospheric Pressure Thermal-Plasma-Jet Induced Continuous Crystalline Growth of Amorphous Silicon Films on Flexible Glass Substrate Using Cylindrical Rotation Stage

〇Wataru Nakano¹, Hiroaki Hanafusa¹, Seiichiro Higashi¹ (1.Hiroshima Univ.)