Shin Ishimatsu

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Speaker, Author, Co-Author

Tue. Sep 5, 2017 9:00 AM - 12:00 PM C11 (Office 1)

Oral presentation
| 13 Semiconductors
| 13.3 Insulator technology

[5a-C11-1~11] 13.3 Insulator technology

6.1と13.3と13.5のコードシェアセッションあり

11:15 AM - 11:30 AM

[5a-C11-9] A study on high-k HfN film formation utilizing ECR-N₂ plasma nitridation

〇Shin Ishimatsu¹, Rengie Mark Mailig¹, Sohya Kudoh¹, Shun-ichiro Ohmi¹ (1.Tokyo Inst.)