Shunsuke Ochiai

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Speaker, Author, Co-Author

Tue. Sep 5, 2017 1:15 PM - 5:45 PM S42 (Conf. Room 2)

Oral presentation
| 7 Beam Technology and Nanofabrication
| 7.3 Micro/Nano patterning and fabrication

[5p-S42-1~15] 7.3 Micro/Nano patterning and fabrication

2:45 PM - 3:00 PM

[5p-S42-6] Composition ratio dependence of exposure characteristics of positive tone electron beam resist containing p-chloro-α-methylstyrene (Ⅱ)

〇(M2)Shunsuke Ochiai¹, Tomohiro Takayama¹, Yukiko Kishimura¹, Hironori Asada¹, Minako Iwakuma², Manae Sonoda², Ryoichi Hoshinno³ (1.Yamaguchi Univ., 2.NIT, Miyakonojo College, 3.FMS Inc.)

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