Noriko Miura

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Speaker, Author, Co-Author

Wed. Sep 6, 2017 1:45 PM - 7:00 PM C21 (C21)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[6p-C21-1~20] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

4:00 PM - 4:15 PM

[6p-C21-10] Fabrication of pMOSFET using Minimal Water Plasma Ashing Process

〇Noriko Miura^1,2, Takeshi Aizawa², Fumito Imura^1,3, Takeshi Yamada², Mitsunori Nogawa², Yasuhiro Onishi², Tatsuo Ishijima⁴, Hiroaki Suzuki⁴, Taishin Shimada⁴, Sommawan Khumpuang^1,3, Shiro Hara^1,3 (1.MINIMAL, 2.YONEKURA, 3.AIST, 4.KANAZAWA UNIVERSITY)

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