Norihisa Takei

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Speaker, Author, Co-Author

Wed. Sep 6, 2017 1:45 PM - 7:00 PM C21 (C21)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[6p-C21-1~20] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

2:15 PM - 2:30 PM

△ [6p-C21-3] Si epitaxial growth and doping using silane on-site generated by high-density hydrogen plasma

〇(M2)Norihisa Takei¹, Hiroaki Kakiuchi¹, Kiyoshi Yasutake¹, Hiromasa Ohmi¹ (1.Osaka Univ.)