Tetsuya Goto

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Speaker, Author, Co-Author

Wed. Sep 6, 2017 1:45 PM - 7:00 PM C21 (C21)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[6p-C21-1~20] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

3:15 PM - 3:30 PM

[6p-C21-7] Silicon Nitride Film Formations Using the Magnetic-Mirror-Confined Plasma Source for Minimal Fab System

〇Tetsuya Goto¹, Kei-ichiro Sato², Yuki Yabuta³, Shigetoshi Sugawa¹, Shiro Hara^4,5 (1.Tohoku Univ., 2.Kotec Co., LTD., 3.Seinan Industries Co., LTD., 4.AIST, 5.MINIMAL)

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