Azumi Ito

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Speaker, Author, Co-Author

Thu. Sep 7, 2017 9:00 AM - 11:45 AM A402 (402+403)

Oral presentation
| 8 Plasma Electronics
| 8.4 Plasma etching

[7a-A402-1~10] 8.4 Plasma etching

10:30 AM - 10:45 AM

[7a-A402-6] The Etching Characteristics and Dissociation Behavior of High Selective Si₃N₄ Etching Gas C₄H₉F

〇Azumi Ito¹, Hirotoshi Inui¹, Hirokazu Matsumoto¹ (1.Zeon Corporation)