Yuki Kondo

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Speaker, Author, Co-Author

Thu. Sep 7, 2017 9:00 AM - 11:45 AM A402 (402+403)

Oral presentation
| 8 Plasma Electronics
| 8.4 Plasma etching

[7a-A402-1~10] 8.4 Plasma etching

11:00 AM - 11:15 AM

△ [7a-A402-8] Effect of Bias Voltage for Removal of DLC Films by Using Oxygen Plasma

〇Yuki Kondo¹, Itaru Fujita¹, Satoshi Degai¹, Tsuyoshi Tanimoto¹, Toru Harigai¹, Yoshiyuki Suda¹, Hirofumi Takikawa¹, Hidenobu Gonda², Yasuhiro Hadano³, Masao Kamiya⁴ (1.Toyohashi Univ. Technol, 2.OSG Corp., 3.Kojima Ind. Corp., 4.Itoh Opt. Ind. co., Ltd.)

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