Kosuke Takenaka

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Speaker, Author, Co-Author

Thu. Sep 7, 2017 3:00 PM - 7:30 PM A402 (402+403)

Oral presentation
| 8 Plasma Electronics
| 8.3 Plasma deposition of thin film and surface treatment

[7p-A402-7~23] 8.3 Plasma deposition of thin film and surface treatment

3:45 PM - 4:00 PM

[7p-A402-10] Formation of High-Mobility IGZO Thin Film Transistors with Plasma Enhanced Reactive Sputter Deposition (II)

Yuichi Setsuhara¹, Masashi Endo¹, 〇Kosuke Takenaka¹, Giichiro Uchida¹, Akinori Ebe² (1.Osaka Univ., 2.EMD Corp.)

Fri. Sep 8, 2017 9:30 AM - 11:30 AM PB4 (P)

Poster presentation
| 8 Plasma Electronics
| 8.3 Plasma deposition of thin film and surface treatment

[8a-PB4-1~20] 8.3 Plasma deposition of thin film and surface treatment

9:30 AM - 11:30 AM

[8a-PB4-18] Low-temperature Formation of Crystallized Aluminum Nitride Thin Films with Plasma-Enhanced Pulsed DC Magnetron Sputtering

〇Kosuke Takenaka¹, Yoshikatsu Satake¹, Giichiro Uchida¹, Yuichi Setsuhara¹ (1.Osaka Univ.)