Poster presentation

8 Plasma Electronics » 8.3 Plasma deposition of thin film and surface treatment

[8a-PB4-1~20] 8.3 Plasma deposition of thin film and surface treatment

Fri. Sep 8, 2017 9:30 AM - 11:30 AM PB4 (P)

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9:30 AM - 11:30 AM

[8a-PB4-1] Preparing of multi-elements thin films using powder target for fuel cells

〇Hiroharu Kawasaki¹, Hikaru Yoshino¹, Tamiko Ohshima¹, Yoshihito Yagyu¹, Takeshi Ihara¹, Masanori Shinohara¹, Yoshihiro Nojiri¹ (1.Nat. inst. Tech. Sasebo)

9:30 AM - 11:30 AM

△ [8a-PB4-2] Effects of substrate temperature on Si-H₂ bonds formation at P/I interface

〇Kazuma Tanaka¹, Hisayuki Hara¹, Takashi Kojima¹, Shota Nagaishi¹, Susumu Toko¹, Daisuke Yamashita¹, Hyunwoong Seo¹, Naho Itagaki¹, Kazunori Koga¹, Masaharu Shiratani¹ (1.Kyushu Univ.)

9:30 AM - 11:30 AM

[8a-PB4-3] Preparation of AZO thin film on Polycarbonate by RF sputtering and its application

〇Kosei Sugawara¹, Yasunori Ohtsu¹ (1.Saga Univ.)

9:30 AM - 11:30 AM

△ [8a-PB4-4] Effects of gas pressure on crystal quality of ZION films fabricated by RF magnetron sputtering

〇Liu Shi¹, Nanoka Miyahara¹, Daisuke Yamashita¹, Hyunwoong Seo¹, Kazunori Koga¹, Masaharu Shiratani¹, Naho Itagaki¹ (1.Kyushu Univ.)

9:30 AM - 11:30 AM

[8a-PB4-5] Behavior of species in HiPIMS using carbon target

〇(M1)Kazunori Iga¹, Takayuki Ohta¹, Akinori Oda², Hiroyuki Kousaka³ (1.Meijo Univ., 2.Chiba Inst. Technol., 3.Gifu Univ.)

9:30 AM - 11:30 AM

△ [8a-PB4-6] Fabrication of InN-rich (ZnO)_x(InN)_1-x films on sapphire substrate by sputter epitaxy

〇Nanoka Miyahara¹, Kazuya Iwasaki¹, Shi Liu¹, Hyunwoong Seo¹, Kazunori Koga¹, Masaharu Shiratani¹, Naho Itagaki¹ (1.Kyushu Univ.)

9:30 AM - 11:30 AM

△ [8a-PB4-7] Laser Scattering Measurement in Deposition Process of SiO:CH Particle by CCP-CVD

〇(B)Koji Horigome¹, Mamoru Yazaki¹, Takumi Aihara¹, Yasusi Inoue¹, Osamu Takai² (1.Chiba Inst., 2.Kantou gakuin Univ.)

9:30 AM - 11:30 AM

△ [8a-PB4-8] Spectroscopic in-situ Measurements during SiO:CH Deposition by ICP-CVD

〇(B)masato seitou¹, Toshiki Hirai¹, Takumi Aihara¹, Yasusi Inoue¹, Osamu Takai² (1.Chibakoudai Inst., 2.Kantou Gakuin Univ.)

9:30 AM - 11:30 AM

△ [8a-PB4-9] Effect of Substrate Bias on Amino Group Modification onto Fluorocarbon Polymer Surface by He/NH₃Gas Mixture Atmospheric Pressure Plasma Jets

〇Masahiro Kimpara¹, Masaaki Nagatsu^1,2,3 (1.Shizuoka Univ., 2.Shizuoka Univ., 3.Shizuoka Univ)

9:30 AM - 11:30 AM

△ [8a-PB4-10] Ageing Property of Amino-modified Surface of Graphite-encapsulated Magnetic Nanoparticles Fabricated by One-step DC Arc Discharge Method

〇Taiki Furukawa¹, Rui Hu², Masaaki Nagatsu^2,3 (1.Shizuoka Univ., 2.Shizuoka Univ.,, 3.Shizuoka Univ. ,)

9:30 AM - 11:30 AM

△ [8a-PB4-11] Effect of Hydroxyl Group Modification on Resin Adhesion of Aluminum Surface Irradiated by H2O Vapor Added He Gas Atmospheric Pressure Plasma

〇Hiroto Nito¹, Kunio Hayakawa¹, Masaaki Nagatsu^1,2 (1.Shizuoka Univ., 2.Shizuoka Univ)

9:30 AM - 11:30 AM

△ [8a-PB4-12] Highly-sensitive E. Coli Detection Property of Magnetic Nanoparticles Functionalized with Carboxyl Groups by Ar/H₂O RF Plasma

〇Takuya Omura¹, Anchu Viswan², Masaaki Nagatsu^1,2 (1.ShizuokaUniv., 2.Shizuoka Univ.)

9:30 AM - 11:30 AM

△ [8a-PB4-13] Fabrication of SiC films on Si(111) substrates via impurity mediated crystallization

〇Kouki Imoto¹, Daisuke Yamashita¹, Hyunwoong Seo¹, Kazunori Koga¹, Masaharu Shiratani¹, Naho Itagaki¹ (1.Kyushu Univ.)

9:30 AM - 11:30 AM

[8a-PB4-14] Evaluation of isocyanate group on CNT formed by plasma treatment

〇Kazuki Michiya¹, Hideo Uchida¹, Daisuke Ogawa¹, Keiji Nakamura¹ (1.Chubu Univ.)

9:30 AM - 11:30 AM

[8a-PB4-15] Hydrodesulfurization Effect of Sulfur Oxide Using Microwave Excited Hydrogen Plasma

〇Akihisa Ogino¹, Masahiro Sugiyama¹ (1.Shizuoka Univ.)

9:30 AM - 11:30 AM

[8a-PB4-16] Formation of a-C:F by plasma irradiation on the PFC condensation layer and PTFE surface modification

〇Tetsuya Sato¹, Kouta Yamai¹, Kyouhei Morikawa¹, Haruka Soga¹, Chiaya Yamamoto¹, Junji Yamanaka¹, Kiyokazu Nakagawa¹ (1.Univ. of Yamanashi)

9:30 AM - 11:30 AM

[8a-PB4-17] DLC On-site Deposition by Atmospheric-Pressure Pen-like PlasmaⅢ

〇Hiroyuki Yoshiki¹, Kousuke Gando^1,2 (1.Tsuruoka NCT, 2.Canon Inc.)

9:30 AM - 11:30 AM

[8a-PB4-18] Low-temperature Formation of Crystallized Aluminum Nitride Thin Films with Plasma-Enhanced Pulsed DC Magnetron Sputtering

〇Kosuke Takenaka¹, Yoshikatsu Satake¹, Giichiro Uchida¹, Yuichi Setsuhara¹ (1.Osaka Univ.)

9:30 AM - 11:30 AM

[8a-PB4-19] Deposition of Ga doped ZnO films using narrow-gap RF magnetron sputtering

〇Yoshinobu Matsuda¹, Kohei Sakamoto¹, Naoki Matsuo¹, Tomohiro Furusato¹, Takahiko Yamashita¹ (1.Nagasaki Univ.)

9:30 AM - 11:30 AM

[8a-PB4-20] Bonding Strength of PTFE Treated by Plasma-Graft Polymerization

〇Tomoyuki Kuroki¹, Yudai Togashi¹, Keita Hori¹, Kohei Suzuki¹, Masaaki Okubo¹ (1.Osaka Pref. Univ.)

Session information

[8a-PB4-1~20] 8.3 Plasma deposition of thin film and surface treatment

[8a-PB4-1] Preparing of multi-elements thin films using powder target for fuel cells

△ [8a-PB4-2] Effects of substrate temperature on Si-H₂ bonds formation at P/I interface

[8a-PB4-3] Preparation of AZO thin film on Polycarbonate by RF sputtering and its application

△ [8a-PB4-4] Effects of gas pressure on crystal quality of ZION films fabricated by RF magnetron sputtering

[8a-PB4-5] Behavior of species in HiPIMS using carbon target

△ [8a-PB4-6] Fabrication of InN-rich (ZnO)_x(InN)_1-x films on sapphire substrate by sputter epitaxy

△ [8a-PB4-7] Laser Scattering Measurement in Deposition Process of SiO:CH Particle by CCP-CVD

△ [8a-PB4-8] Spectroscopic in-situ Measurements during SiO:CH Deposition by ICP-CVD

△ [8a-PB4-9] Effect of Substrate Bias on Amino Group Modification onto Fluorocarbon Polymer Surface by He/NH₃Gas Mixture Atmospheric Pressure Plasma Jets

△ [8a-PB4-10] Ageing Property of Amino-modified Surface of Graphite-encapsulated Magnetic Nanoparticles Fabricated by One-step DC Arc Discharge Method

△ [8a-PB4-11] Effect of Hydroxyl Group Modification on Resin Adhesion of Aluminum Surface Irradiated by H2O Vapor Added He Gas Atmospheric Pressure Plasma

△ [8a-PB4-12] Highly-sensitive E. Coli Detection Property of Magnetic Nanoparticles Functionalized with Carboxyl Groups by Ar/H₂O RF Plasma

△ [8a-PB4-13] Fabrication of SiC films on Si(111) substrates via impurity mediated crystallization

[8a-PB4-14] Evaluation of isocyanate group on CNT formed by plasma treatment

[8a-PB4-15] Hydrodesulfurization Effect of Sulfur Oxide Using Microwave Excited Hydrogen Plasma

[8a-PB4-16] Formation of a-C:F by plasma irradiation on the PFC condensation layer and PTFE surface modification

[8a-PB4-17] DLC On-site Deposition by Atmospheric-Pressure Pen-like PlasmaⅢ

[8a-PB4-18] Low-temperature Formation of Crystallized Aluminum Nitride Thin Films with Plasma-Enhanced Pulsed DC Magnetron Sputtering

[8a-PB4-19] Deposition of Ga doped ZnO films using narrow-gap RF magnetron sputtering

[8a-PB4-20] Bonding Strength of PTFE Treated by Plasma-Graft Polymerization

Authentication

Session information

[8a-PB4-1~20] 8.3 Plasma deposition of thin film and surface treatment

△ [8a-PB4-2] Effects of substrate temperature on Si-H2 bonds formation at P/I interface

△ [8a-PB4-4] Effects of gas pressure on crystal quality of ZION films fabricated by RF magnetron sputtering

△ [8a-PB4-6] Fabrication of InN-rich (ZnO)x(InN)1-x films on sapphire substrate by sputter epitaxy

△ [8a-PB4-7] Laser Scattering Measurement in Deposition Process of SiO:CH Particle by CCP-CVD

△ [8a-PB4-8] Spectroscopic in-situ Measurements during SiO:CH Deposition by ICP-CVD

△ [8a-PB4-9] Effect of Substrate Bias on Amino Group Modification onto Fluorocarbon Polymer Surface by He/NH3 Gas Mixture Atmospheric Pressure Plasma Jets

△ [8a-PB4-10] Ageing Property of Amino-modified Surface of Graphite-encapsulated Magnetic Nanoparticles Fabricated by One-step DC Arc Discharge Method

△ [8a-PB4-11] Effect of Hydroxyl Group Modification on Resin Adhesion of Aluminum Surface Irradiated by H2O Vapor Added He Gas Atmospheric Pressure Plasma

△ [8a-PB4-12] Highly-sensitive E. Coli Detection Property of Magnetic Nanoparticles Functionalized with Carboxyl Groups by Ar/H2O RF Plasma

△ [8a-PB4-13] Fabrication of SiC films on Si(111) substrates via impurity mediated crystallization

Authentication

△ [8a-PB4-2] Effects of substrate temperature on Si-H₂ bonds formation at P/I interface

△ [8a-PB4-6] Fabrication of InN-rich (ZnO)_x(InN)_1-x films on sapphire substrate by sputter epitaxy

△ [8a-PB4-9] Effect of Substrate Bias on Amino Group Modification onto Fluorocarbon Polymer Surface by He/NH₃Gas Mixture Atmospheric Pressure Plasma Jets

△ [8a-PB4-12] Highly-sensitive E. Coli Detection Property of Magnetic Nanoparticles Functionalized with Carboxyl Groups by Ar/H₂O RF Plasma