Toshiki Nishimoto

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Speaker, Author, Co-Author

Fri. Sep 8, 2017 9:15 AM - 12:00 PM C21 (C21)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[8a-C21-1~11] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

11:15 AM - 11:30 AM

[8a-C21-9] First-principles study on Schottky barrier at TiN/Ge interfaces

〇(M1)Toshiki Nishimoto¹, Takashi Nakayama¹ (1.Chiba Univ.)