[5a-S44-1~11] 【CS.9】7.1 & 7.4 Code-sharing session

[5a-S44-6] Study on Organic Thin Film Ablation Using Femtosecond Extreme Ultraviolet Pulses

〇Kazuyuki Sakaue¹, Masahiko Ishino², Toshiro Itani³, Yuichi Inubushi⁴, Satoshi Ichimaru⁵, Shigeki Owada⁶, Takuto Ogura⁷, Hiroo Kinoshita⁸, Yuya Koshiba⁹, Akira Kon⁴, Julius Santillan³, Natsumi Shinozaki⁷, Takashi Takahashi⁹, Toshiki Tamura⁷, Dinh-Thanh Hung², Masaharu Nishikino², Takehiro Nishidome⁹, Tadashi Hatano¹⁰, Hiroyuki Hara⁷, Takeshi Higashiguchi⁷, Shun Yamauchi⁷, Masakazu Washio⁹ (1.WIAS, Waseda Univ., 2.QST Kansai, 3.EIDEC, 4.JASRI, 5.NTT-AT, 6.RIKEN, 7.Utsunomiya Univ., 8.Univ. Hyogo, 9.RISE, Waseda Univ., 10.Tohoku Univ.)

Keywords:EUV, Ablation, Organi Thin Film

As a next generation EUV sources, ultra-short EUV pulse is the one of the candidates. Such EUV pulse has a high peak power property so we concerned that the material ablation threshold would be lowered. We studied about the ablation of organic thin film using SACLA BL-1 EUV laser. The results of ablation experiment and future prospective will be presented at the conference.