The 78th JSAP Autumn Meeting, 2017

Presentation information

Oral presentation

15 Crystal Engineering » 15.4 III-V-group nitride crystals

[5p-A301-1~19] 15.4 III-V-group nitride crystals

Tue. Sep 5, 2017 1:15 PM - 6:45 PM A301 (Main Hall)

Kazunobu Kojima(Tohoku Univ.), Yoshio Honda(Nagoya Univ.), Yoshiki Saito(TOYODA GOSEI)

6:00 PM - 6:15 PM

[5p-A301-17] Achievement of high-EQE(10%)AlGaN deep-UV LED using highly-reflective PhC

Yukio Kashima1,2, Noritoshi Maeda1, Eriko Matsuura1,2, Masafumi Jo1, Takeshi Iwai3, Toshiro Morita3, Mitsunori Kokubo4, Takaharu Tashiro4, Ryuichiro Kamimura5, Yamato Osada5, Hideki Takagi6, Hideki Hirayama1 (1.RIKEN, 2.Marubun, 3.Tokyo Ohka, 4.Toshiba Machine, 5.ULVAC, 6.AIST)

Keywords:Highly-reflective photonic crystal, Light extraction efficiency, AlGaN deep-UV LED

Highly-reflective photonic crystal(HR-PhC) was fabricated on transparent p-AlGaN contact layer of DUV-LEDs by nano-imprinting and damageless ICP dry-etching technology.Electrode was fabricated by tilting evaporation method.By introducing HR-PhC in case evaporating highly-reflective(75%) Ni/Mg electrode external quantum efficiency(EQE) was was increased from 7.5% to 10%.