[5p-A301-1~19] 15.4 III-V-group nitride crystals

[5p-A301-18] Damage-less fine control fabrication of highly-reflective PhC for AlGaN deep-UV LED

〇Yukio Kashima^1,2, Takaharu Tashiro³, Mitsunori Kokubo³, Ryuichiro Kamimura⁴, Yamato Osada⁴, Takeshi Iwai⁵, Toshiro Morita⁵, Eriko Matsuura^1,2, Noritoshi Maeda¹, Masafumi Jo¹, Hideki Takagi⁶, Hideki Hirayama¹ (1.RIKEN, 2.Marubun, 3.Toshiba Machine, 4.ULVAC, 5.Tokyo Ohka, 6.AIST)

Keywords:Highly-reflective photonic crystal, Process integration of nano-imprinting and ICP dry-etching, Bi-layer resist

In order to optimize an effect of highly-reflective photonic crystal a fine control fabrication of PhC pattern's profile (diameter,period,depth) and precise positioning are necessary.The process integration of nano-imprint patterning of bi-layer resist to a hole wafer and damage-less ICP dry-etching has been performed precisely within 10nm precision in this research.