[5p-S42-1~15] 7.3 Micro/Nano patterning and fabrication

△ [5p-S42-12] Thin residual layer for a high viscosity UV curing resin by liquid transfer technique

〇Hiroki Ueda¹, Taniguchi Jun¹ (1.TUS)

Keywords:nano imprint, liquid transfer, high viscosity resin

When curing the resin with UV-NIL, an extra resin layer called residual layer is generated between the pattern and the substrate. As a removal method of the residual layer, there is LTIL which removes surplus resin by peeling off the dummy substrate. However, in the case of high viscosity resin, it is difficult to remove the residual layer even with LTIL. In order to solve this, extra resin was extruded and thinned by a roll press before the liquid transfer operation using a high viscosity UV curing resin having a viscosity of 2900 cP and the same refractive index as water, and as a result, the residual layer was able to 0 did it.