The 78th JSAP Autumn Meeting, 2017

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7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[5p-S42-1~15] 7.3 Micro/Nano patterning and fabrication

Tue. Sep 5, 2017 1:15 PM - 5:45 PM S42 (Conf. Room 2)

Toru Yamaguchi(NTT), Jiro Yamamoto(HITACHI), Jun Taniguchi(Tokyo Univ. of Sci.)

5:00 PM - 5:15 PM

[5p-S42-13] Impact of Resist Residual Layer on Nanoimprint Lithography Performance

〇Kasumi Okabe1, Kei Kobayashi1, Masaki Mitsuyasu1, Kazuya Fukuhara1, Hirokazu Kato1, Takuya Kono1, Jung Wooyung2 (1.Toshiba Memory, 2.SK Hynix)

Keywords:Nanoimprint, Residual layer

We are developing nanoimprint lithography as semiconductor technology which forms the detailed pattern at low cost. Impact of residual resist layer formed by NIL on overlay and defectivity performance has been investigated. We found there is optimal thickness in terms of overlay and defectivity. By optimizing the thickness, the best NIL performance can be achieved.