[5p-S42-1~15] 7.3 Micro/Nano patterning and fabrication

[5p-S42-7] Location control of Metal Nanoparticles Using Combination of Top-down and Bottom up Nano-fabricatioon

〇Hiroki Yamamoto¹, Bunsho Ohtani², Takahiro Kozawa¹ (1.ISIR, Osaka Univ., 2.ICAT, Hokkaido Univ.)

Keywords:Electron beam, Self-assembly monolayer, Metal nanoparticles

Metal nanoparticle is expected as small-sized electronic devices such as single electron transistors, biosensing application and so on. In order to develop novel devices and biosensing application, it is essential to construct ordered structure of the nanoparticles on solid substrate. Lithography technique is one of method for the patterning of nanostructure. Also, one of the promising methods for constructing such an ordered structure is to attach the nanoparticles chemically onto a highly order molecule layer of functional molecules such as self-assembled monolayers (SAMs), which are formed by spontaneous organization of thiolated molecules on a desired metal surface. In this study, we tried to do location control of nanoparticles using combination of top-down and bottom-up nanofabrication.