The 78th JSAP Autumn Meeting, 2017

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7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[5p-S42-1~15] 7.3 Micro/Nano patterning and fabrication

Tue. Sep 5, 2017 1:15 PM - 5:45 PM S42 (Conf. Room 2)

Toru Yamaguchi(NTT), Jiro Yamamoto(HITACHI), Jun Taniguchi(Tokyo Univ. of Sci.)

2:45 PM - 3:00 PM

[5p-S42-6] Composition ratio dependence of exposure characteristics of positive tone electron beam resist containing p-chloro-α-methylstyrene (Ⅱ)

〇(M2)Shunsuke Ochiai1, Tomohiro Takayama1, Yukiko Kishimura1, Hironori Asada1, Minako Iwakuma2, Manae Sonoda2, Ryoichi Hoshinno3 (1.Yamaguchi Univ., 2.NIT, Miyakonojo College, 3.FMS Inc.)

Keywords:non-chemically amplified resist, exposure characteristics, composition ratio