Oral presentation

[5p-S42-1~15] 7.3 Micro/Nano patterning and fabrication

Tue. Sep 5, 2017 1:15 PM - 5:45 PM S42 (Conf. Room 2)

Toru Yamaguchi(NTT), Jiro Yamamoto(HITACHI), Jun Taniguchi(Tokyo Univ. of Sci.)

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1:15 PM - 1:30 PM

△ [5p-S42-1] Fabrication of Medical Stent Using Synchronous Scan-Projection Lithography and Chemical Etching

〇Kaiki Ito¹, Yuta Suzuki¹, Toshiyuki horiuchi¹ (1.Tokyo Denki Univ.)

1:30 PM - 1:45 PM

[5p-S42-2] Coarse-grain molecular dynamics simulation of vertical lamellar phase of diblock copolymer in a thin film

〇Toru Yamaguchi¹, Hirotaka Tanaka¹, Nicolas Clement¹, Akira Fujiwara¹ (1.NTT BRL)

1:45 PM - 2:00 PM

△ [5p-S42-3] Evaluation of Triblock Copolymer Structure using Soft X-Ray Scattering

〇(M2)Yusuke Nakatani¹, Tetsuo Harada¹, Atsushi Takano², Motoyuki Yamada¹, Takeo Watanabe¹ (1.Univ. of Hyogo, 2.Nagoya Univ.)

2:00 PM - 2:15 PM

[5p-S42-4] Characterization of CMOS image sensor for soft x-ray

〇Tetsuo Harada¹, Yusuke Nakatani¹, Nobukazu Teranishi¹, Takeo Watanabe¹ (1.Univ. of Hyogo)

2:30 PM - 2:45 PM

△ [5p-S42-5] Absorption Coefficient Measurement Advanced Method of EUV Resist by Direct-Resist Coating on a Photodiode

〇(M1)Shota Niihara¹, Daiki Mamezaki¹, Masanori Watanabe¹, Tetsuo Harada¹, Takeo Watanabe¹ (1.Univ. of Hyogo)

2:45 PM - 3:00 PM

[5p-S42-6] Composition ratio dependence of exposure characteristics of positive tone electron beam resist containing p-chloro-α-methylstyrene (Ⅱ)

〇(M2)Shunsuke Ochiai¹, Tomohiro Takayama¹, Yukiko Kishimura¹, Hironori Asada¹, Minako Iwakuma², Manae Sonoda², Ryoichi Hoshinno³ (1.Yamaguchi Univ., 2.NIT, Miyakonojo College, 3.FMS Inc.)

3:00 PM - 3:15 PM

[5p-S42-7] Location control of Metal Nanoparticles Using Combination of Top-down and Bottom up Nano-fabricatioon

〇Hiroki Yamamoto¹, Bunsho Ohtani², Takahiro Kozawa¹ (1.ISIR, Osaka Univ., 2.ICAT, Hokkaido Univ.)

3:15 PM - 3:30 PM

△ [5p-S42-8] Fabrication of a biomimetic inspired 3D mold by using acceleration and dose modulation electron beam lithography

〇Kohei Goto¹, Taniguchi Jun¹ (1.TUS)

3:45 PM - 4:00 PM

△ [5p-S42-9] Fabrication of semiconductor nanopatterns on atomically stepped ultra-flat polymer substrates by thermal nanoimprint technique

〇Risa Goto¹, Shiori Yamada¹, Takumi Sannomiya¹, Satoru Kaneko², Akifumi Matsuda¹, Mamoru Yoshimoto¹ (1.Tokyo Tech. Materials, 2.KISTEC)

4:00 PM - 4:15 PM

[5p-S42-10] Room-temperature nanoimprint for high-aspect pattern fabrication

〇Makoto Okada¹ (1.LASTI, Univ. of Hyogo)

4:15 PM - 4:30 PM

[5p-S42-11] Computational study on induced strain in direct nanoimprint lithography

〇Kenta Watanabe¹, Tastuya Iida¹, Hiroaki Kawata¹, Masaaki Yasuda¹, Yoshihiko Hirai¹ (1.OPU)

4:30 PM - 4:45 PM

△ [5p-S42-12] Thin residual layer for a high viscosity UV curing resin by liquid transfer technique

〇Hiroki Ueda¹, Taniguchi Jun¹ (1.TUS)

5:00 PM - 5:15 PM

[5p-S42-13] Impact of Resist Residual Layer on Nanoimprint Lithography Performance

〇Kasumi Okabe¹, Kei Kobayashi¹, Masaki Mitsuyasu¹, Kazuya Fukuhara¹, Hirokazu Kato¹, Takuya Kono¹, Jung Wooyung² (1.Toshiba Memory, 2.SK Hynix)

5:15 PM - 5:30 PM

[5p-S42-14] Fabrication of antireflection structures on the aspheric lens

〇Ichiro Mano¹, Jun Taniguchi¹ (1.TUS)

5:30 PM - 5:45 PM

△ [5p-S42-15] Evaluation of UV nanoimprint and multilayer lift-off process using spin-on-glass for nanogap electrode array

〇Kyouhei Hashiguchi^1,2, Kenta Suzuki², Hiroshi Hiroshima², Hiroshi Suga¹ (1.CIT, 2.AIST)

Poster presentation

[6a-PA7-1~2] 7.3 Micro/Nano patterning and fabrication

Wed. Sep 6, 2017 9:30 AM - 11:30 AM PA7 (P)

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9:30 AM - 11:30 AM

△ [6a-PA7-1] Thermal nanoimprinting of periodic nanostructure on atomic stepped polymer subsrate using a self-assembly formed mold

〇Taichiro Kinoshita¹, Ken Iwasa¹, Satoru Kaneko^2,1, Akifumi Matsuda¹, Mamoru Yoshimoto¹ (1.Tokyo Inst. of Tech. Materials, 2.KISTECH)