9:30 AM - 9:45 AM
[6a-A201-3] Electrical characteristics of W/SiO2/nSiC-MOS capacitor with post metallization annealing
Keywords:SiC, TDMAS, PMA
Oral presentation
15 Crystal Engineering » 15.6 Group IV Compound Semiconductors (SiC)
Wed. Sep 6, 2017 9:00 AM - 12:15 PM A201 (201)
Koji Kita(Univ. of Tokyo), Hiroaki Hanafusa(Hiroshima Univ.)
9:30 AM - 9:45 AM
Keywords:SiC, TDMAS, PMA