The 78th JSAP Autumn Meeting, 2017

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Symposium (Oral)

Symposium » Nanoscale 3D analyses for new device and materials development

[6p-C19-1~8] Nanoscale 3D analyses for new device and materials development

Wed. Sep 6, 2017 1:45 PM - 5:30 PM C19 (C19)

Masato Koyama(TOSHIBA), Tomihiro Hashizume(Hitachi, Ltd.)

4:30 PM - 4:45 PM

[6p-C19-6] Estimation of field strength for field-induced oxygen etching by in-situ atom probe analysis

〇Kazuki Ohtani1, Shigekazu Nagai1, Tatsuo Iwata1, Koichi Hata1 (1.Graduate school of Eng., Mie Univ.)

Keywords:atom probe analysis, tungsten, surface oxidation