[7a-A201-1~8] 15.6 Group IV Compound Semiconductors (SiC)

[7a-A201-5] Low temperature formation of SiC thin film by chemical vapor deposition using vinylsilane precursor

〇Takuma Doi¹, Wakana Takeuchi¹, Yong Jin², Hiroshi Kokubun², Shigeo Yasuhara², Osamu Nakatsuka^1,3, Shigeaki Zaima³ (1.Nagoya Univ., 2.Japan Advanced Chemicals Ltd., 3.IMaSS, Nagoya Univ.)

Keywords:semiconductor, SiC