The 78th JSAP Autumn Meeting, 2017

Presentation information

Oral presentation

15 Crystal Engineering » 15.4 III-V-group nitride crystals

[7a-A301-1~11] 15.4 III-V-group nitride crystals

Thu. Sep 7, 2017 9:00 AM - 12:00 PM A301 (Main Hall)

Tsutomu Araki(Ritsumeikan Univ.), Jitsuo Ohta(Univ. of Tokyo)

9:30 AM - 9:45 AM

[7a-A301-3] Effects of buffer layer on InN growth on Graphite substrate

〇(M1)Shingo Arakawa1, Yuuto Kubonaka1, Kotomi Kuroda1, Ukyo Ohe1, Shinichiro Mouri1, Tsutomu Araki1, Yasushi Nanishi1 (1.Ritsumeikan Univ.)

Keywords:Indium Nitride, Graphene, Layered material

We have suggested DERI method and utilization of layered material like graphene as a substrate for high quality InN growth. We have reported nanocrystalline InN was grown on graphite flakes transferred on GaN template. Here, we investigated the effects of buffer layer to improve the wettability of graphite. We found that the coalescence of nano crystal was often confirmed AlN buffer layer.