The 78th JSAP Autumn Meeting, 2017

Presentation information

Oral presentation

8 Plasma Electronics » 8.3 Plasma deposition of thin film and surface treatment

[7p-A402-7~23] 8.3 Plasma deposition of thin film and surface treatment

Thu. Sep 7, 2017 3:00 PM - 7:30 PM A402 (402+403)

Yasushi Inoue(Chiba Inst. of Tech.), Yasunori Ohtsu(Saga Univ.)

6:15 PM - 6:30 PM

[7p-A402-19] Study on the low temperature synthesis of graphene using a blowing-type plasma

Jaeho Kim1, Hajime Sakakita1, Hirotomo Itagaki1 (1.AIST)

Keywords:graphene, plasma CVD, nano carbon

In this work, we have been developed an advanced plasma CVD technology for the low-temperature synthesis of large-area and high-quality graphene films using a blowing-type plasma. In this talk, the plasma CVD technology and our recent experimental results will be presented.