[7p-A402-7~23] 8.3 Plasma deposition of thin film and surface treatment

[7p-A402-20] Diamond growth by using a high density radical source with nonthermal plasma

〇Jaeho Kim¹, Hideaki Yamada¹, Hajime Sakakita¹ (1.AIST)

Keywords:diamond, plasma CVD, epitaxial growth

In this work, we have developed a epitaxial growth method of a large-area and high-quality sinlge diamond using a line-type plasma jet which is based on microstrip line. In this talk, the background of this work and our recent experimental results will be reported.