The 78th JSAP Autumn Meeting, 2017

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Oral presentation

8 Plasma Electronics » 8.4 Plasma etching

[7p-A402-1~6] 8.4 Plasma etching

Thu. Sep 7, 2017 1:15 PM - 2:45 PM A402 (402+403)

Tetsuya Tatsumi(Sony)

2:00 PM - 2:15 PM

[7p-A402-4] Molecular dynamics simulation of SiO2 atomic layer etching by fluorocarbon plasmas and Ar plasmas

〇(M2)Yuki Okada1, Michiro Isobe1, Satoshi Hamaguchi1 (1.Osaka Univ.)

Keywords:SiO2 etching, Molecular dynamics simulation