Oral presentation
8 Plasma Electronics » 8.4 Plasma etching
Thu. Sep 7, 2017 1:15 PM - 2:45 PM A402 (402+403)
Tetsuya Tatsumi(Sony)
△：奨励賞エントリー
▲：英語発表
▼：奨励賞エントリーかつ英語発表
空欄：どちらもなし
1:15 PM - 1:30 PM
〇Taku Iwase1, Kazuhiro Karahashi2, Satoshi Hamaguchi2 (1.Hitachi R&D, 2.Osaka Univ.)
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1:30 PM - 1:45 PM
Akiko Hirata1, 〇Masanaga Fukasawa1, Kazunori Nagahata1, Hu Li2, Tomoko Ito2, Kazuhiro Karahashi2, Satoshi Hamaguchi2, Tetsuya Tatsumi1 (1.Sony Semiconductor Solutions Corp., 2.Osaka Univ.)
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1:45 PM - 2:00 PM
〇Shuya Murakami1, Shusuke Yamashita1, Shinya Yoneda1, Kazuo Takahashi1, Takeshi Yamao1 (1.Kyoto Institute of Technology)
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2:00 PM - 2:15 PM
〇(M2)Yuki Okada1, Michiro Isobe1, Satoshi Hamaguchi1 (1.Osaka Univ.)
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2:15 PM - 2:30 PM
〇Yukihiro Tsuji1, Tetsuya Hattori1, Masaki Yanagisawa1, Hajime Shoji1 (1.Sumitomo Electric Industries, Ltd.)
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2:30 PM - 2:45 PM
〇Isao Mori1, Motohiro Tanaka1, Tetsuo Kawanabe2, Soichiro Eto2, Naoki Yasui1 (1.Hitachi High-Technologies Corp., 2.Hitachi, Ltd.)
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