Observation of ALD-Al2O3 Film Growth on Sputtered MoS2 Film

Haruki Tanigawa; Takumi Ohashi; Kentaro Matsuura; Junichi Shimizu; Mayato Toyama; Naoki Hayakawa; Iriya Muneta; Kuniyuki Kakushima; Kazuo Tsutsui; Hitoshi Wakabayashi

Presentation information

Oral presentation

17 Nanocarbon Technology » 17.3 Layered materials

[7p-C11-1~21] 17.3 Layered materials

Thu. Sep 7, 2017 1:45 PM - 7:30 PM C11 (Office 1)

Masaki Tanemura(Nagoya Inst. of Tech.), Yasuhide Ohno(Tokushima univ)

3:45 PM - 4:00 PM

[7p-C11-9] Observation of ALD-Al₂O₃ Film Growth on Sputtered MoS₂ Film

〇Haruki Tanigawa¹, Takumi Ohashi¹, Kentaro Matsuura¹, Junichi Shimizu¹, Mayato Toyama¹, Naoki Hayakawa¹, Iriya Muneta¹, Kuniyuki Kakushima¹, Kazuo Tsutsui¹, Hitoshi Wakabayashi¹ (1.Tokyo Tech.)

Keywords:MoS2, ALD

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Presentation information

[7p-C11-1~21] 17.3 Layered materials

[7p-C11-9] Observation of ALD-Al2O3 Film Growth on Sputtered MoS2 Film

[7p-C11-9] Observation of ALD-Al₂O₃ Film Growth on Sputtered MoS₂ Film