[7p-C13-1~9] GFIS（電界電離ガスイオン源）・先端イオン源顕微鏡技術とその材料・デバイス研究開発への応用

▲ [7p-C13-4] Single-nanometer graphene patterning with helium ion beam for extreme sensing and phonon engineering applications

〇Hiroshi Mizuta¹、Marek Schmidt¹、Mayeesha Haque¹、Shinichi Ogawa²、Manoharan Muruganathan¹ (1.JAIST、2.AIST)

キーワード：ion beam, graphene, nanofabrication

We report on our recent attempt of single-nanometer-scale patterning of suspended graphene structures by using focused helium ion beam of sub-1-nm in diameter. A ~6 nm wide suspended graphene nanoribbons are fabricated with electrical contacts, and the electrical transport characteristics are discussed along with their potential impact on the performance of graphene-NEMS-based single-molecular detection. We also demonstrate large-area arrays of 3-4 nanometer pores with pitch of down to ~ 16 nm patterned on suspended GNRs and their unique properties as phononic crystals. The possibility of their application to nanoscale heat phonon engineering will be discussed.