[7p-C13-1~9] GFIS（電界電離ガスイオン源）・先端イオン源顕微鏡技術とその材料・デバイス研究開発への応用

▲ [7p-C13-8] The three-dimensional nanofabrication technology using foucusd-ion-beam

〇Reo Kometani¹ (1.Univ. of Tokyo)

キーワード：focused-ion-beam, nanofabrication, the three-dimensional nanostructure

Focused-ion-beam chemical vapor deposition (FIB-CVD) enables us to fabricate the three-dimensional (3-D) nanostructure and devices. We have been researching on the growth characteristics, pattern generator, material characteristics and device fabrications on the 3-D nanofabrication using FIB-CVD. A patter generator was developed in order to achieve the arbitrary 3-D nanostructure. And, material characteristics were evaluated for the fabrication of functional devices, such as mechanical devices. Also, mechanical devices such as nanomanipulator and optomechanical resonator were achieved by suing FIB-CVD. The 3-D nanostructure fabrication technology using focused-ion-beam will be reported in detail.