[8a-C21-1~11] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

△ [8a-C21-8] Evaluation of Anisotropic Biaxial Stresses in the Ar⁺ ion irradiated Si Nanowire Covered with Oxide Film by Water-immersion Raman Spectroscopy

〇Ryo Yokogawa^1,3, Shuichiro Hashimoto², Motohiro Tomita^1,2,4, Takanobu Watanabe², Atsushi Ogura¹ (1.Meiji Univ., 2.Waseda Univ., 3.JSPS Research Fellow DC, 4.JSPS Research Fellow PD)

Keywords:Raman spectroscopy, Si nanowire