[8a-PB4-1~20] 8.3 Plasma deposition of thin film and surface treatment

[8a-PB4-18] Low-temperature Formation of Crystallized Aluminum Nitride Thin Films with Plasma-Enhanced Pulsed DC Magnetron Sputtering

〇Kosuke Takenaka¹, Yoshikatsu Satake¹, Giichiro Uchida¹, Yuichi Setsuhara¹ (1.Osaka Univ.)

Keywords:Aluminum Nitride