[8a-PB4-1~20] 8.3 Plasma deposition of thin film and surface treatment

△ [8a-PB4-2] Effects of substrate temperature on Si-H₂ bonds formation at P/I interface

〇Kazuma Tanaka¹, Hisayuki Hara¹, Takashi Kojima¹, Shota Nagaishi¹, Susumu Toko¹, Daisuke Yamashita¹, Hyunwoong Seo¹, Naho Itagaki¹, Kazunori Koga¹, Masaharu Shiratani¹ (1.Kyushu Univ.)

Keywords:hydrogenated amorphous silicon, solar cell, plasma CVD