The 78th JSAP Autumn Meeting, 2017

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8 Plasma Electronics » 8.3 Plasma deposition of thin film and surface treatment

[8a-PB4-1~20] 8.3 Plasma deposition of thin film and surface treatment

Fri. Sep 8, 2017 9:30 AM - 11:30 AM PB4 (P)

9:30 AM - 11:30 AM

△ [8a-PB4-7] Laser Scattering Measurement in Deposition Process of SiO:CH Particle by CCP-CVD

〇(B)Koji Horigome1, Mamoru Yazaki1, Takumi Aihara1, Yasusi Inoue1, Osamu Takai2 (1.Chiba Inst., 2.Kantou gakuin Univ.)

Keywords:Thin film, plasma, laser