[8a-PB5-1~3] 8.8 Plasma Electronics English Session

▼ [8a-PB5-3] Effects of gas pressure on the surface morphology of a-C:H films
deposited using Ar + H₂+ C₇H₈ plasma CVD

〇Taojun Fang¹、Kenji Yamaki¹、Kazunori Koga¹、Daisuke Yamashita¹、Hyunwoong Seo¹、Naho Itagaki¹、Masaharu Shiratani¹ (1.Kyushu University)

キーワード：a-C:H films, surface morphology, CVD