1:30 PM - 3:30 PM
[8p-PA2-3] Reactive ion etching of CaF2 / Si heterostructure using CF4 / O2 plasma
Keywords:CaF2, RIE, hetero devices
Presentation information
Poster presentation
13 Semiconductors » 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology
[8p-PA2-1~19] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology
Fri. Sep 8, 2017 1:30 PM - 3:30 PM PA2 (P)