Oral presentation
[6a-C21-1~12] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology
Wed. Sep 6, 2017 9:15 AM - 12:15 PM C21 (C21)
Kazuyoshi Ueno(Shibaura Inst. of Tech), Masahide Goto(NHK)
△:奨励賞エントリー
▲:英語発表
▼:奨励賞エントリーかつ英語発表
空欄:どちらもなし
9:15 AM - 9:30 AM
〇Yusuke Omata1, Takashi Aoki1, Tomokazu Sasaki2, Tomohisa Mizuno1 (1.Kanagawa Univ., 2.Toshiba Nanoanalysis Corp.)
9:30 AM - 9:45 AM
〇Shinji Nakada1, Masaki Yamamoto1, Sho Irie1, Yusuke Omata1, Takashi Aoki1, Toshiyuki Sameshima2, Tomohisa Mizuno1 (1.Kanagawa Univ., 2.Tokyo Univ Agri. Tech.)
9:45 AM - 10:00 AM
〇Tamon Kunieda1, Toru Watanabe1, Mai Hong Minh1, Hitoshi Habuka1 (1.Yokohama Nat. Univ.)
10:00 AM - 10:15 AM
〇Toru Watanabe1, Mai Hong Minh1, Hitoshi Habuka1 (1.Yokohama Nat. Univ.)
10:15 AM - 10:30 AM
〇Tatsurou Sagawa1, Nakamura Masayuki1, Kobayashi Takayuki1, Tatsuta Toshiaki1, Motoyama Shin-ich1 (1.Samco Inc)
10:30 AM - 10:45 AM
〇Ryutaro Suda1, Akira Kojima1, Jun-ichi Shirakashi1, Nobuyoshi Koshida1 (1.Tokyo Univ. of Agri. & Technol.)
10:45 AM - 11:00 AM
〇Hiromasa Ohmi1, Tatuya Hirono1, Yusuke Kubota2, Yoshiki Sirasu1, Hiroaki Kakiuchi1, Kiyoshi Yasutake1 (1.Osaka Univ., 2.Tokyo Electron LTD.)
11:00 AM - 11:15 AM
〇Mamiko Yagi1, Jun-ichi Shirakashi1 (1.Tokyo Univ. of A. & T.)
11:15 AM - 11:30 AM
〇(M2)Koichi Kido1, Daisuke Ando1, Yuji Suto1, Junichi Koike1 (1.Tohoku Univ.)
11:30 AM - 11:45 AM
〇Yoshiyuki Watanabe1, Toru Yahagi1, Yutaka Abe1, Hiroki Murayama1 (1.Yamagata Inst. Tech.)
11:45 AM - 12:00 PM
〇(M2)Tasuku Sato1, Shingo Maeda1, Yoko Yamanishi2 (1.Shibaura Inst., 2.Kyushu Univ.)
12:00 PM - 12:15 PM
Katsuki Tsukasaki1, Shinya Kumagai1, 〇Minoru Sasaki1 (1.Toyota Technol. Inst.)