kazushige sato

→ Search for kazushige sato in Google Scholar

Speaker, Author, Co-Author

Wed. Sep 6, 2017 1:45 PM - 7:00 PM C21 (C21)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[6p-C21-1~20] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

3:30 PM - 3:45 PM

[6p-C21-8] Characteristics of p-MOS transistors with gate oxides formed by Minimal Fab Laser Heating

〇kazushige sato^1,3, Takashi Chiba^1,3, Masao Terada^1,3, Shinichi Ikeda^1,2, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.Minimal Fab General Incorporated Association, 2.AIST, 3.Sakaguchi E.H VOC Corp)

▲