Yusuke Omata

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Speaker, Author, Co-Author

Wed. Sep 6, 2017 9:15 AM - 12:15 PM C21 (C21)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[6a-C21-1~12] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

9:15 AM - 9:30 AM

△ [6a-C21-1] Hot C⁺ ion Implantation Optimization for Forming Nano-SiC Region at Surface (100)SOI Substrate

〇Yusuke Omata¹, Takashi Aoki¹, Tomokazu Sasaki², Tomohisa Mizuno¹ (1.Kanagawa Univ., 2.Toshiba Nanoanalysis Corp.)