Mitsuko Muroi

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Speaker, Author, Co-Author

Wed. Sep 6, 2017 1:45 PM - 7:00 PM C21 (C21)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[6p-C21-1~20] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

2:45 PM - 3:00 PM

[6p-C21-5] Effect of substrate rotation on silicon epitaxial growth rate in minimal CVD reactor

Miya Matsuo¹, 〇Mitsuko Muroi¹, Ning Li¹, Hitoshi Habuka¹, Takanori Mikahara^2,3, Shin-ichi Ikeda^2,3, Yuuki Ishida^2,3, Shiro Hara^2,3 (1.Yokohama Nat. Univ., 2.MINIMAL, 3.AIST)

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