Tetsuya Goto

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Speaker, Author, Co-Author

Thu. Mar 16, 2017 9:00 AM - 12:15 PM E206 (E206)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[16a-E206-1~13] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

9:30 AM - 9:45 AM

[16a-E206-3] Silicon Nitride Film Formations Using the New Magnetically-Confined ECR Plasma Source for Minimal Fab System

〇Tetsuya Goto¹, Kei-ichiro Sato², Yuki Yabuta³, Shigetoshi Sugawa¹, Shiro Hara^4,5 (1.Tohoku Univ., 2.Kotec, 3.Seinan Industries, 4.AIST, 5.MINIMAL)

Thu. Mar 16, 2017 9:00 AM - 12:15 PM 502 (502)

Oral presentation
| 21 Joint Session K
| 21.1 Joint Session K

[16a-502-1~12] 21.1 Joint Session K

11:00 AM - 11:15 AM

[16a-502-8] Impact of Si Ion Implantation on Properties of IGZO Thin Films

〇Tetsuya Goto¹, Fuminobu Imaizumi¹, Shigetoshi Sugawa¹ (1.Tohoku Univ.)