Tomohiro Nakamura

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Speaker, Author, Co-Author

Fri. Mar 17, 2017 9:00 AM - 12:45 PM E206 (E206)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[17a-E206-1~14] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

11:00 AM - 11:15 AM

[17a-E206-9] Effect of annealing on threading-dislocation densities of suputter-epitaxial Ge film on Si

〇Tomohiro Nakamura¹, Wengchang Yeh¹, Shunichi Sato² (1.Shimane Univ., 2.Ricoh Co.)