Hiroki Tamaru

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Speaker, Author, Co-Author

Tue. Mar 14, 2017 9:15 AM - 12:00 PM 304 (304)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[14a-304-1~10] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

9:45 AM - 10:00 AM

[14a-304-3] Crystallization and Activation of As+ doped Amorphous Ge films by Excimer Laser Annealing

〇Hiroki Tamaru¹, Hiroshi Ikenoue², Seiichiro Higashi¹ (1.Graduate School of Advanced Sciences of Matter, Hiroshima Univ., 2.Department of Gigaphoton Next GLP, Kyushu Univ.)

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