Yuki Yuasa

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Speaker, Author, Co-Author

Wed. Mar 15, 2017 9:00 AM - 11:30 AM 304 (304)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[15a-304-1~10] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

9:30 AM - 9:45 AM

[15a-304-3] Nanomechanical Structure Fabrication from NEB-22 Resist by FIB/EB Dual-Beam Lithography

〇Yuki Yuasa¹, Etsuo Maeda¹, Reo Kometani¹ (1.The Univ. of Tokyo)