[15a-304-1~10] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[15a-304-3] Nanomechanical Structure Fabrication from NEB-22 Resist by FIB/EB Dual-Beam Lithography

〇Yuki Yuasa¹, Etsuo Maeda¹, Reo Kometani¹ (1.The Univ. of Tokyo)

Keywords:NEMS, lithography

Carbon nano mechanical structure is expected to be applied to NEMS resonator sensor etc. In this research, to create a simple fabrication process of carbon nano mechanical structure, the structure is fabricated from NEB-22 by FIB/EB Dual-Beam Lithography and the fabrication property is analyzed. From this analysis, increase of the filmy thickness with the increase in exposure Dose and that the fabrication of the film structure of the approximately 70nm thickness was possible were confirmed.