Shiyang Ji

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Speaker, Author, Co-Author

Wed. Mar 15, 2017 9:00 AM - 12:15 PM F204 (F204)

Oral presentation
| 15 Crystal Engineering
| 15.6 Group IV Compound Semiconductors (SiC)

[15a-F204-1~12] 15.6 Group IV Compound Semiconductors (SiC)

11:15 AM - 11:30 AM

▲ [15a-F204-9] Investigation on the optimal growth region for 4H-SiC CVD trench filling

〇Shiyang Ji¹, Ryoji Kosugi¹, Kazutoshi Kojima¹, Kazuhiro Mochizuki¹, Shingo Saito¹, Yoko Matsukawa¹, Yoshiyuki Yonezawa¹, Sadafumi Yoshida¹, Hajime Okumura¹ (1.AIST)

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