Keisuke Kobayashi

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Speaker, Author, Co-Author

Thu. Mar 16, 2017 1:45 PM - 6:30 PM 502 (502)

Symposium (Oral)
| Symposium
| Process technology for advanced power semiconductor devices

[16p-502-1~10] Process technology for advanced power semiconductor devices

3:15 PM - 3:30 PM

△ [16p-502-4] Oxygen pressure controlled oxidation for gate insulator process of SiC MOSFET

〇Keisuke Kobayashi¹, Haruka Shimizu¹, Akio Shima¹ (1.Hitachi, Ltd. R&D Group)