Masato Imamura

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Speaker, Author, Co-Author

Fri. Mar 17, 2017 9:00 AM - 11:30 AM 313 (313)

Oral presentation
| 8 Plasma Electronics
| 8.4 Plasma etching

[17a-313-1~10] 8.4 Plasma etching

10:00 AM - 10:15 AM

[17a-313-5] Effects of Additive Gases on Characteristics of Low Damage Plasma Etching
of GaN in Cl2 Based Plasma at High Temperature

〇Masato Imamura¹, Liu Zecheng¹, Pan Jialin¹, Nanide Atsushi³, Ishikawa Kenzi¹, Takeda Keigo¹, Kondo Hiroki¹, Oda Osamu¹, Sekine Makoto¹, Hori Masaru² (1.Nagoya Univ., 2.Nagoya Univ. Inst. Innovation for Future Society, 3.SCREEN Holdings)