Ryo Isono

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Speaker, Author, Co-Author

Fri. Mar 17, 2017 9:00 AM - 1:00 PM 315 (315)

Oral presentation
| 8 Plasma Electronics
| 8.3 Plasma deposition of thin film and surface treatment

[17a-315-1~15] 8.3 Plasma deposition of thin film and surface treatment

9:45 AM - 10:00 AM

△ [17a-315-4] Characterization of Tungsten Carbide Thin Films Fabricated by Using Filtered Pulse Arc Deposition

〇Ryo Isono¹, Toru Harigai¹, Yushi Iijima¹, Yoshiyuki Suda¹, Hirofumi Takikawa¹ (1.Toyohashi Univ. Technol.)